R. Kim et al., Discharge characteristics of MgO and MgO-ZrO2 protective films prepared byelectron beam evaporation, MAT SCI E B, 83(1-3), 2001, pp. 55-60
In order to improve both the operating voltage and the memory coefficient (
MC) of a protective layer for AC plasma display panels, controlled amount o
f ZrO2 was added to the pure MgO. The effects of the ZrO2 addition on both
the electrical properties (V-f and V-s) and the microstructure of the Mg2-2
NZrxO2 films deposited by e-beam evaporation were investigated. As the [ZrO
2/(MgO + ZrO2)] ratio of the protective materials increased, the oxygen con
tent in films increased and the relative ratio of (200)/(111) also increase
d with overall peak shifting to lower angular diffraction positions. The fi
ring voltage of the MgO-ZrO2 protective films, when the [ZrO2/(MgO + ZrO2)]
ratio was 0.1, was 5% lower than that of the conventional MgO protective f
ilms with higher MC. (C) 2001 Elsevier Science B.V. All rights reserved.