To investigate the electronic excitation effect on ion-induced atomic displ
acement, we have applied a carbon (C)-film collector method to measure the
sputtering yields of YBa2Cu3O7-delta (YBCO) by high energy heavy ions. The
collection efficiency of the C-films is calibrated by using 120 keV Ne+ ion
s and the values are obtained as 0.048, 0.076, 0.061 and 0.3 for Y, Ba, Cu
and O, respectively. The total sputtering yields of YBCO induced by 198 MeV
1, 69 MeV Ni and 80 MeV S ions are evaluated as 1030, 580 and 100, respect
ively, including oxygen contribution. These values are larger by a factor o
f similar to 1000 than the calculated sputtering yield due to the elastic c
ollision cascade, indicating a significant contribution of the electronic e
xcitation to the sputtering yields. It also appeals that the total sputteri
ng yields scale reasonably with the square of the electronic stopping power
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