We have used conversion electron emission channeling to determine the latti
ce location of Er-167 (t(1/2) = 2.28 s) in TnP after 60 keV room temperatur
e implantation of Tm-167 (t(1/2) = 9.25 d) at a dose of 6.8 x 10(12) cm(-2)
. Following annealing at temperatures above the major recovery step of the
implantation damage at 100-150 degreesC, we observe around 75% of Er on sub
stitutional In sites. A smaller fraction of Er (6%) is found on substitutio
nal P sites, the remainder on random sites. Annealing the unprotected InP c
rystal at temperatures above 250 degreesC in vacuum causes a decrease in th
e channeling effects. (C) 2001 Elsevier Science B.V. All rights reserved.