Electronic transport in thin Cr films modified by Fe ion implantation

Citation
C. Heck et al., Electronic transport in thin Cr films modified by Fe ion implantation, NUCL INST B, 175, 2001, pp. 296-299
Citations number
14
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
175
Year of publication
2001
Pages
296 - 299
Database
ISI
SICI code
0168-583X(200104)175:<296:ETITCF>2.0.ZU;2-W
Abstract
Fe nanostructures were produced in Cr films by means of ion implantation fo llowed by anneal at different temperatures. The magnetoresistance of these systems is spin valve-like, but small (about 1%). The resistivity shows a v ery broad minimum at fairly high temperatures, similar to the observed in a morphous metals, spin or cluster glasses, or disordered materials. This can be assigned to defect related scattering in these materials. (C) 2001 Else vier Science B.V. All rights reserved.