Sequential implants of Ti and O ions into Al2O3 lead to stabilisation of Ti
in the optically active 3(+) oxidation state when suitable implantation an
d annealing conditions are used. The presence of Ti3+ in sapphire gives ris
e to luminescence over the wavelength range similar to 650-1100 nm and is t
he basis of the broadly tunable Ti3+ in sapphire laser. We present results
of Rutherford backscattering spectrometry and ion channeling (RBS-C) measur
ements which show the structural changes that accompany increases in the Ti
3+ luminescence yield during post-implantation thermal processing of Ti/O i
mplanted sapphire substrates. Complementary information is provided by prot
on induced X-ray emission and channeling measurements indicating the lattic
e location of the Ti atoms. (C) 2001 Elsevier Science B.V. All rights reser
ved.