The effect of N+ ion energy on the properties of ion bombarded plasma polymer films

Citation
Ec. Rangel et al., The effect of N+ ion energy on the properties of ion bombarded plasma polymer films, NUCL INST B, 175, 2001, pp. 594-598
Citations number
9
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
175
Year of publication
2001
Pages
594 - 598
Database
ISI
SICI code
0168-583X(200104)175:<594:TEONIE>2.0.ZU;2-X
Abstract
This work describes the influence of the ion bombardment on the electrical, optical and mechanical properties of polymer films deposited from radio-fr equency plasmas of benzene. Irradiations were conducted using N+ at 5 x 10( 19) ions/m(2), varying the ion energy, E-0, from 0 to 150 keV. Film element al composition was determined by Rutherford backscattering spectroscopy. El ectrical resistivity and hardness were obtained by the two-point probe and nanoindentation technique, respectively. Ultraviolet-visible spectroscopy w as employed to investigate the optical constants of the samples. Etching ra te was determined by exposure of the films to reactive oxygen plasmas. Ion bombardment induced gradual loss of H and increase in C and O concentration s with Eo. As a consequence the electrical, optical and mechanical properti es were drastically affected. Interpretation of these results is proposed i n terms of chain cross-linking and unsaturation. (C) 2001 Elsevier Science B.V. All rights reserved.