Determination of ion incidence angles in plasma immersion ion implantationby means of a hollow multi-aperture target

Citation
M. Galonska et al., Determination of ion incidence angles in plasma immersion ion implantationby means of a hollow multi-aperture target, NUCL INST B, 175, 2001, pp. 658-662
Citations number
8
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
175
Year of publication
2001
Pages
658 - 662
Database
ISI
SICI code
0168-583X(200104)175:<658:DOIIAI>2.0.ZU;2-6
Abstract
In plasma immersion ion implantation, ions are accelerated from a spherical cathode sheath edge which surrounds the target. On a non-spherical target, a distribution of angles of ion incidence can be expected. In order to det ermine the angles of ion incidence, a hollow cylindrical target with an upp er cover plate with small drill holes was used. Ions enter the target throu gh these apertures and impinge onto the inner bottom which is covered with cellulose. The organic material is blackened as a consequence of ion bombar dment. The position of the black spots is determined by the position of the aperture with respect to the cellulose bottom and by the angle under which the ions enter the aperture, i.e. the angle of ion incidence on the plate. By measuring the position of the spots, the angles of incidence can be cal culated. The obtained data show that in the center of the cylindrical targe t the ions impinge at right angles, whereas in the outer parts smaller angl es of incidence are found. The distribution of angles is a function of the process parameters such as pulse length and pulse voltage. (C) 2001 Elsevie r Science B.V. All rights reserved.