A compact ion source has been designed for use in the production of amorpho
us carbon thin films with diamond-like properties. This filament-discharge
ion source works very efficiently at a low input electrical power. The desi
gn, which is simple and reliable, has some features that makes it distinct
from that of the multicusp and plasma discharge ion sources. We have achiev
ed a transportable beam with a current density of 100 mA cm(-2) delivered b
y a filament-discharge power of 150 W. The final goal of this development i
s associated to the design of a particle accelerator for applications that
require high beam intensities, like the boron neutron capture therapy. (C)
2001 Elsevier Science B.V. All rights reserved.