New compact design for an ion source

Citation
H. Huck et al., New compact design for an ion source, NUCL INST B, 175, 2001, pp. 772-776
Citations number
6
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
175
Year of publication
2001
Pages
772 - 776
Database
ISI
SICI code
0168-583X(200104)175:<772:NCDFAI>2.0.ZU;2-8
Abstract
A compact ion source has been designed for use in the production of amorpho us carbon thin films with diamond-like properties. This filament-discharge ion source works very efficiently at a low input electrical power. The desi gn, which is simple and reliable, has some features that makes it distinct from that of the multicusp and plasma discharge ion sources. We have achiev ed a transportable beam with a current density of 100 mA cm(-2) delivered b y a filament-discharge power of 150 W. The final goal of this development i s associated to the design of a particle accelerator for applications that require high beam intensities, like the boron neutron capture therapy. (C) 2001 Elsevier Science B.V. All rights reserved.