Stepped-current experiments are applied to the study of barrier film format
ion on an Al-6.5 at.% W alloy prepared by magnetron sputtering. These revea
l transient changes in the composition and/or the density in local regions
of the anodic film immediately following changes in the current density bet
ween 0.1 and 10 mA cm-(2). Specifically,following an increase and a decreas
e in the current, bands of film material approximately 6 nm thick are gener
ated at, or near, the alloy-film interface, which are, firstly, respectivel
y enriched and depleted in tungsten species and/or, secondly, of enhanced a
nd reduced density respectively. There is also evidence that similar bands
are generated simultaneously at, or near, the film-electrolyte interface. F
urther, either the density or the composition of film material formed at th
e alloy-film interface, or a combination of these factors, depends upon the
current, with material retaining to some extent its original property as t
he film develops at the new current. Possible reasons for the occurrence of
these features are considered.