Kinetic roughening in etched Si

In this work, surface morphology of Si etched surfaces generated with disti nct physical constrains for attack, has been investigated by atomic force m icroscope (AFM). Statistical properties measured from AFM images prove that these surfaces present self-affine behavior; and also suggest that Si chem ical attacks can be described as a 2+1 percolation inner random medium with quenched noise. (C) 2001 Elsevier Science B.V. All rights reserved.