Fine structure of the inner electric field in semiconductor laser diodes studied by EFM

Citation
A. Ankudinov et al., Fine structure of the inner electric field in semiconductor laser diodes studied by EFM, PHYS LOW-D, 3-4, 2001, pp. 9-16
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICS OF LOW-DIMENSIONAL STRUCTURES
ISSN journal
02043467 → ACNP
Volume
3-4
Year of publication
2001
Pages
9 - 16
Database
ISI
SICI code
0204-3467(2001)3-4:<9:FSOTIE>2.0.ZU;2-#
Abstract
Electrostatic force microscopy in dynamical contact and non-contact modes i s employed to study the distribution of the electric field and capacitance at the cleavages of AlGaAs/GaAs based p-i-n laser diode heterostructures. T he fine structure of the inner electric field located at the i-waveguide of the laser heterostructure is revealed and investigated under forward and b ackward biases applied to the diode. The redistribution of the electric fie ld in favor of i-waveguide/p-emitter interface is observed at high level of injected current. When the injected current is increased, a growth of the capacitance signal at the i-waveguide is also detected which may reflect th e injected carriers distribution.