Boron-rich boron nitride (BN) films prepared by a single spin-coating process of a polymeric precursor

Crack-free and highly smooth boron-rich boron nitride (BN) films with a thi ckness of up to 2 mum have been prepared on Si and SiO2/Si substrates by va cuum or inert atmosphere pyrolysis at 900-1100 degreesC of single spin-coat ed polyborazine films. The thickness of the BN films depends on the polymer ization time of the borazine monomer and the polymer concentration, and the surface morphology on pyrolytic conditions. As the pyrolytic temperatures increase, the films displayed lower IR absorption for residual N-H bonds an d higher crystallinity with better preferential orientation along the subst rate surface, but severe inter-diffusion phenomena at the interface. Micros tructural development of the prepared films was thoroughly characterized by SEM, XRD, SPM, IR, SIMS and high resolution TEM. (C) 2001 Elsevier Science B.V. All rights reserved.