Chemical nanolithography with electron beams

A highly focused electron beam as the agent for spatially selective reducti on of nitro groups to amino groups in a self-assembled monolayer of aromati cs is the key feature of a novel technique in chemical nanolithography pres ented here. Treatment of the reactive amino groups with different reactants after each e-beam writing step yields a surface with a defined array of ch emically diverse structures; for example, see the line pattern in the Figur e.