Growth of silica particles in surfactant gel

Citation
S. Nagamine et al., Growth of silica particles in surfactant gel, ADV POW TEC, 12(2), 2001, pp. 145-156
Citations number
19
Categorie Soggetti
Chemical Engineering
Journal title
ADVANCED POWDER TECHNOLOGY
ISSN journal
09218831 → ACNP
Volume
12
Issue
2
Year of publication
2001
Pages
145 - 156
Database
ISI
SICI code
0921-8831(2001)12:2<145:GOSPIS>2.0.ZU;2-1
Abstract
Growth of silica particles produced by the hydrolysis of tetraethoxysilane (TEOS) in gels of the cationic surfactant, cetyltrimethylammonium bromide ( CTAB), was investigated by static light scattering and dynamic light scatte ring measurements. The time evolution of the size of the silica particles w as estimated by the static and the dynamic correlation lengths obtained fro m the two measurements. Both the growth rate and the final size were smalle r at higher concentrations of CTAB, indicating that a more confined network exerted a more restrictive effect on the particle growth. The random motio n of silica particles was more severely restricted when the particle was la rger and the network mesh size was smaller at higher CTAB concentrations. T his restriction of movement resulted in the cessation of the growth of sili ca particles.