Frequency-dependent resistive and capacitive components in RF MOSFETs

Citation
Yh. Cheng et M. Matloubian, Frequency-dependent resistive and capacitive components in RF MOSFETs, IEEE ELEC D, 22(7), 2001, pp. 333-335
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE ELECTRON DEVICE LETTERS
ISSN journal
07413106 → ACNP
Volume
22
Issue
7
Year of publication
2001
Pages
333 - 335
Database
ISI
SICI code
0741-3106(200107)22:7<333:FRACCI>2.0.ZU;2-G
Abstract
It is found from measured high frequency (HF) s-parameter data that the ext racted effective gate sheet resistance (R-gsh), effective gate unit-area ca pacitance (C-gg,C-unit), and transconductance (G(m)) in radio-frequency (RF ) MOSFETs show strong frequency dependency when the device operates at freq uencies higher than some critical frequency. As frequency increases, R-gsh increases but C-gg,C-unit and G(m) decrease. This behavior is different fro m what we have observed in low or medium frequencies, at which these compon ents are constant over a frequency range, This phenomenon has been observed in MOSFETs with L-f longer than 0.35 mum at frequency higher than 1 GHz, a nd becomes more serious as L-f is longer and frequency is higher. This beha vior can be explained by a MOSFET model considering Non-Quasi-Static (NQS) effect. Simulation results show that a RF model based on BSIM3v3 with NQS e ffect describes well the behaviors of both real and imaginary parts of Y-21 of the device with strong NQS effect even though its fitting to Y-11 needs to be improved further.