Electron mobility models for 4H, 6H, and 3C SiC

Citation
M. Roschke et F. Schwierz, Electron mobility models for 4H, 6H, and 3C SiC, IEEE DEVICE, 48(7), 2001, pp. 1442-1447
Citations number
32
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
48
Issue
7
Year of publication
2001
Pages
1442 - 1447
Database
ISI
SICI code
0018-9383(200107)48:7<1442:EMMF46>2.0.ZU;2-N
Abstract
Models for the electron mobility in the three most important silicon carbid e (SiC) polytypes, namely 4H, 6H, and 3C SiC are developed, A large number of experimental mobility data and Monte Carlo (MC) results reported in the literature have been evaluated and serve as the basis for the model develop ment. The proposed models describe the dependence of the electron mobility on doping concentration, temperature, and electric field, The lo low-field mobility in 4H SIC is much higher than in 6H and 3C in the doping range int eresting for RF power transistors (10(16) Cm-3 ...10(18) Cm-3), whereas the saturation velocities in the three polytypes investigated are nearly the s ame (slightly above 2 x 10(7) cm/s at 300 K). The models developed can be e asily incorporated into numerical device simulators.