Kr. Bhat et al., Role of poly(ADP-ribose) polymerase (PARP) in DNA repair in sulfur mustard-exposed normal human epidermal keratinocytes (NHEK), J APPL TOX, 20, 2000, pp. S13-S17
We previously reported that, in normal human epidermal keratinocytes (NHEK)
cultures exposed to the alkylating compound sulfur mustard (bis-(2-chloroe
thyl) sulfide, HD, 0.3-1 mM), there is a rapid (less than or equal to1 h) a
ctivation (100% above unexposed control) of the DNA repair enzyme DNA ligas
e I (130 kD) followed by a first-order decay (1-5 h), The DNA ligase activa
tion is accompanied by a time-dependent (0.5-4 h) and significant DNA repai
r. Inhibition of another putative DNA repair enzyme, poly(ADP-ribose) polym
erase (PARP), by using 3-amino benzamide does not affect DNA ligase activat
ion following HD exposure, but increases the half-life of the activated enz
yme threefold. To examine the role of PARP in HD-induced DNA ligase activat
ion and subsequent DNA repair, we conducted studies using cultured keratino
cytes in which the level of PARP had been selectively lowered (greater than
or equal to 85%) by the use of induced expression of antisense RNA. In the
se cells, there was no stimulation of DNA ligase up to 3 h, and a small sti
mulation (ca, 30% above unexposed control at 5-6 h after HD exposure. A tim
e-course (0.5-6 h) study of DNA repair in HD-exposed PARP-deficient keratin
ocytes revealed a much slower rate of repair compared with HD-exposed NHEK.
The results suggest an active role of PARP in DNA ligase activation and DN
A repair in mammalian cells, and also indicate that modulation of PARP-medi
ated mechanisms may provide a useful approach in preventing HD toxicity.