Growth of silicon crystal with a diameter of 400 mm and weight of 400 kg

Citation
Y. Shiraishi et al., Growth of silicon crystal with a diameter of 400 mm and weight of 400 kg, J CRYST GR, 229(1), 2001, pp. 17-21
Citations number
10
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
229
Issue
1
Year of publication
2001
Pages
17 - 21
Database
ISI
SICI code
0022-0248(200107)229:1<17:GOSCWA>2.0.ZU;2-2
Abstract
Since 1996, we have been investigating the crystal growth of 400-mm silicon crystals as the next generation of silicon wafer size after 300 mm. The fi rst dislocation-free crystal was grown in 1998, and the heaviest dislocatio n free crystal ever, weighing 413 kg, was safely grown in 2000 using a crys tal suspending system. In this paper, we describe an experimental study on large-diameter silicon crystal growth, its growth conditions, and the cryst al properties of 400-mm silicon crystals. (C) 2001 Elsevier Science B.V. Al l rights reserved.