Surface step model for micropipe formation in SiC

Citation
N. Ohtani et al., Surface step model for micropipe formation in SiC, J CRYST GR, 226(2-3), 2001, pp. 254-260
Citations number
17
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
226
Issue
2-3
Year of publication
2001
Pages
254 - 260
Database
ISI
SICI code
0022-0248(200106)226:2-3<254:SSMFMF>2.0.ZU;2-P
Abstract
Silicon carbide (SiC) single crystals, a promising material for high power and high temperature semiconductor devices, have microscopic hollow defects , so-called "micropipes." Their formation mechanism is not satisfactorily c larified yet. In this paper, a surface step model for micropipe formation i n SiC single crystals is proposed, where the strong repulsive interaction b etween surface steps on the SiC(0 0 0 1) surface is a major driving force f or coalescing unit cell size screw dislocations. (C) 2001 Elsevier Science B.V. All rights reserved.