Dependence of temperature gradient on growth rate in CZ silicon

Citation
A. Natsume et al., Dependence of temperature gradient on growth rate in CZ silicon, J CRYST GR, 225(2-4), 2001, pp. 221-224
Citations number
7
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
225
Issue
2-4
Year of publication
2001
Pages
221 - 224
Database
ISI
SICI code
0022-0248(200105)225:2-4<221:DOTGOG>2.0.ZU;2-D
Abstract
The dependence of temperature gradient in CZ-SI crystal on the growth rate is examined by analyzing the experimental result where growth rate alone wa s varied without changing any other conditions. Unreported data are reprodu ced using the heat balance equation at the interface. It is shown that the temperature gradient increases linearly with the growth rate. The mechanism is discussed in terms of the heat flow and the interface shape. (C) 2001 P ublished by Elsevier Science B.V.