J. Kim et al., MOVPE growth of highly-strained piezoelectric InGaAs/GaAs quantum wells on[111]A-oriented substrates, J CRYST GR, 225(2-4), 2001, pp. 415-419
In this paper we present a study on the MOVPE growth and optical evaluation
of strained InGaAs/GaAs quantum well (QW) structures with In contents of 1
7% and 22% on [111]A-oriented GaAs substrates. QW structures grown under di
fferent growth conditions were extensively analyzed by means of Photolumine
scence (PL) spectroscopy. The dependence of the PL intensity and linewidth
on the growth temperature and In content an investigated and compared to si
multaneously grown [100]-oriented structures. It is shown that excellent QW
interfaces with only +/- (1-2) monolayer roughness were achieved for the [
1 1 1]A-oriented structures with 17% In using a wide range of growth temper
atures (550-670 degreesC), whereas the interfacial properties of the [1 0 0
] samples significantly degraded as the growth temperature was increased. F
or a [1 1 1]A QW structure with 22% In the PL characteristics are similar t
o those obtained for the 17% In sample; on the contrary, for the companion
[1 0 0] sample a strong degradation of its optical properties is observed.
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