MOVPE growth of highly-strained piezoelectric InGaAs/GaAs quantum wells on[111]A-oriented substrates

Citation
J. Kim et al., MOVPE growth of highly-strained piezoelectric InGaAs/GaAs quantum wells on[111]A-oriented substrates, J CRYST GR, 225(2-4), 2001, pp. 415-419
Citations number
23
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
225
Issue
2-4
Year of publication
2001
Pages
415 - 419
Database
ISI
SICI code
0022-0248(200105)225:2-4<415:MGOHPI>2.0.ZU;2-K
Abstract
In this paper we present a study on the MOVPE growth and optical evaluation of strained InGaAs/GaAs quantum well (QW) structures with In contents of 1 7% and 22% on [111]A-oriented GaAs substrates. QW structures grown under di fferent growth conditions were extensively analyzed by means of Photolumine scence (PL) spectroscopy. The dependence of the PL intensity and linewidth on the growth temperature and In content an investigated and compared to si multaneously grown [100]-oriented structures. It is shown that excellent QW interfaces with only +/- (1-2) monolayer roughness were achieved for the [ 1 1 1]A-oriented structures with 17% In using a wide range of growth temper atures (550-670 degreesC), whereas the interfacial properties of the [1 0 0 ] samples significantly degraded as the growth temperature was increased. F or a [1 1 1]A QW structure with 22% In the PL characteristics are similar t o those obtained for the 17% In sample; on the contrary, for the companion [1 0 0] sample a strong degradation of its optical properties is observed. (C) 2001 Elsevier Science B.V. All rights reserved.