Shaped crystal growth of 50 cm diameter silicon thin-walled cylinders by edge-defined film-fed growth (EFG)

Authors
Garcia, D Ouellette, M Mackintosh, B Kalejs, JP
Citation
D. Garcia et al., Shaped crystal growth of 50 cm diameter silicon thin-walled cylinders by edge-defined film-fed growth (EFG), J CRYST GR, 225(2-4), 2001, pp. 566-571
Citations number
11
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
225
Issue
2-4
Year of publication
2001
Pages
566 - 571
Database
ISI
SICI code
0022-0248(200105)225:2-4<566:SCGO5C>2.0.ZU;2-Y
Abstract
A system for growth of 50 cm diameter hollow cylindrical silicon crystals b y the edge-defined film-fed growth (EFG) technique has been designed and co nstructed. Cylinders were grown with lengths up to 1.2m and wall thicknesse s ranging from 75 to 300 mum. Growth speed limits, effects of stress and ma terial chacteristics of the cylinders were investigated to evaluate the pot ential of large diameter EFG systems to provide increased productivity for silicon wafer manufacture. (C) 2001 Elsevier Science B.V. All rights reserv ed.