M. Daraselia et al., Improvement of the accuracy of the in-situ ellipsometric measurements of temperature and alloy composition for MBE grown HgCdTe LWIR/MWIR structures, J ELEC MAT, 30(6), 2001, pp. 637-642
Spectroscopic ellipsometry (SE) has proven to be a very reliable technique
for the in-situ monitoring of the substrate temperature and alloy compositi
on during the HgCdTe epitaxy. In this work, the influence of the variations
in the angle of incidence and the spectral wavelength shift on the measure
d accuracy of the growth temperature and alloy composition are studied, and
a method for precisely determining these variations independent of the mod
eling of the SE data has been developed. It is shown that the stability of
the fittings of the optical models for in-situ applications increases and t
hat the couplings between model parameter decreases upon either eliminating
the angle! of incidence as an independent model parameter or correcting fo
r the shifts of the wavelength offset. The variations in the angle of incid
ence and wavelength shift, which arise in the M88 ellipsometer from reflect
ed beam deflections, were precisely calibrated in two dimensions as a funct
ion of alignment parameters using a thick thermally grown SiO2/Si sample an
d were parameterized for our experimental geometry. A new extension of the
WVASE software was developed to correct the raw SE data in real time for wa
velength shift and the angle of incidence drift. A comparison of the correc
ted and uncorrected results of in-situ temperature measurements for HgCdTe
and CdZnTe(211)B/Si(211) clearly demonstrates that the proposed method sign
ificantly enhances the accuracy of temperature and composition readings ove
r a broad range of values in these parameters.