Defect reduction in Hg1-xCdxTe grown by molecular beam epitaxy on Cd0.96Zn0.04Te(211)B

Citation
F. Aqariden et al., Defect reduction in Hg1-xCdxTe grown by molecular beam epitaxy on Cd0.96Zn0.04Te(211)B, J ELEC MAT, 30(6), 2001, pp. 794-796
Citations number
4
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF ELECTRONIC MATERIALS
ISSN journal
03615235 → ACNP
Volume
30
Issue
6
Year of publication
2001
Pages
794 - 796
Database
ISI
SICI code
0361-5235(200106)30:6<794:DRIHGB>2.0.ZU;2-O
Abstract
A study on preparation of Cd0.96Zn0.04Te(211)B substrates for growth of Hg1 -xCdxTe epitaxial layers by molecular beam epitaxy (MBE) was investigated. The objective was to investigate the impact of starting substrate surface q uality on surface defects such as voids and hillocks commonly observed on M BE Hg1-xCdxTe layers. The results of this study indicate that, when the Cd0 .96Zn0.04Te(211)B substrates are properly prepared, surface defects on the resulting MBE Hg1-xCdxTe films are reduced to minimum (size similar to0.1 m um and density similar to 500/cm(2)), so that these MBE Hg1-xCdxTe films ha ve surface quality as good as that of liquid phase epitaxial (LPE) Hg1-xCdx Te films currently in production in this laboratory.