The results of indium doping on MBE grown HgCdTe were described. It was fou
nd that the indium electrical activation was close to 100% in HgCdTe and th
e donor activation energy was at least smaller than 0.6 meV. It was confirm
ed that a donor concentration of similar to3 X 10(15)cm(-3) was necessarily
preserved for infrared FPAs applications. The diffusion behavior of indium
was studied by thermal annealing, and a diffusion coefficient of similar t
o 10(-14) cm(2)/sec at 400C was obtained, which confirms the feasibility an
d validity of indium as an n-type dopant.