Improved analysis of low frequency noise in dynamic threshold MOS/SOI transistors

Citation
S. Haendler et al., Improved analysis of low frequency noise in dynamic threshold MOS/SOI transistors, MICROEL REL, 41(6), 2001, pp. 855-860
Citations number
15
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
41
Issue
6
Year of publication
2001
Pages
855 - 860
Database
ISI
SICI code
0026-2714(200106)41:6<855:IAOLFN>2.0.ZU;2-W
Abstract
In this paper, low-frequency noise (LFN) in N- and P-channel dynamic-thresh old (DT) MOSFETs on Unibond substrate (SOI) is thoroughly investigated and, especially, an improved formulation of classical McWhorter's noise model i s proposed. In order to confirm our approach, an experimental comparison be tween body tied and DTMOS on SOI substrate has been achieved in terms of LF N behaviour. Furthermore, two different types of DTMOS transistors have bee n used: with and without current limiter. The LFN in DTMOS is analysed in o hmic and saturation regimes and the impact of the use of a current limiter (clamping transistor) is thoroughly analysed. An explanation based on float ing body effect inducing excess noise is also proposed. (C) 2001 Elsevier S cience Ltd. All rights reserved.