The effect of image potential on electron transmission and electric current in the direct tunneling regime of ultra-thin MOS structures

Citation
Lf. Mao et al., The effect of image potential on electron transmission and electric current in the direct tunneling regime of ultra-thin MOS structures, MICROEL REL, 41(6), 2001, pp. 927-931
Citations number
18
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
MICROELECTRONICS RELIABILITY
ISSN journal
00262714 → ACNP
Volume
41
Issue
6
Year of publication
2001
Pages
927 - 931
Database
ISI
SICI code
0026-2714(200106)41:6<927:TEOIPO>2.0.ZU;2-B
Abstract
The direct tunneling current through ultra thin gate dielectrics is modeled by calculating the transmission coefficient of an idealized potential barr ier that is modified by the image force. A numerical solution to the Schrod inger equation shows that the barrier lowering induced by image-potential a ffects the tunneling current largely. An analytical expression for the curr ent is obtained within the Wentel-Kramers-Brillouin approximation. The effe cts of image force on the direct tunneling current are found to increase wi th the applied voltage across oxide (V-ox) and to decrease with the oxide t hickness (T-ox). (C) 2001 Elsevier Science Ltd. All rights reserved.