Photoluminescence from high-energy heavy ion irradiated C-doped SiO2 thin films

Citation
Zg. Wang et al., Photoluminescence from high-energy heavy ion irradiated C-doped SiO2 thin films, NUCL INST B, 179(2), 2001, pp. 289-293
Citations number
19
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences","Instrumentation & Measurement
Journal title
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
ISSN journal
0168583X → ACNP
Volume
179
Issue
2
Year of publication
2001
Pages
289 - 293
Database
ISI
SICI code
0168-583X(200107)179:2<289:PFHHII>2.0.ZU;2-O
Abstract
SiO2 thin films were implanted at room temperature (RT) with 120 keV carbon ions to a dose of 1.0 x 10(17) ions/cm(2) and then irradiated at RT with h igh-energy Kr-84 or Ar-40 ions to a fluence of 1.0 x 10(12) ions/cm(2). Usi ng 320 nm monochromatic ultra-violet light for excitation, photoluminescenc e (PL) properties of these samples were examined and intense blue PL bands were observed. It was found that the blue PL peak intensity changes with el ectronic energy loss of the irradiation ion in the sample. With increasing the electronic energy loss level, the PL peak intensity decreases and the p eak position shifts towards to the short-wavelength direction. Furthermore, the existence of C-dopants enhances the luminescence property of the irrad iated samples. (C) 2001 Elsevier Science B.V. All rights reserved.