Cobalt has been implanted at 30 and 160 keV in three different silica-based
substrates. TEM observations and magnetization measurements performed at R
T and 5 K show that, after implantation, cobalt is present both as metal pa
rticles, few nanometers in size and as smaller oxide particles. Optical abs
orption measurements show that the presence of oxide particles is linked to
the formation of Si-Si bonds during implantation. After thermal treatment
under hydrogen, cobalt is entirely in the metallic form and saturation magn
etization becomes close to its theoretical value. Last, the initial amount
of oxide depends on the OH content of the substrate. (C) 2001 Elsevier Scie
nce B.V. All rights reserved.