In this paper. results of investigation of evolution equations' system desc
ribing hydrogen passivation of silicon are presented. Using Lie group theor
y the classification of invariant solutions and initial system reduction to
systems of ordinary differential equations (ODEs) is carried out for admis
sible infinitesimal operators under constant hydrogen atoms diffusivity in
the sample. Possibility of analytical solution of passivation problem is sh
own. Analysis of system behavior taking into account diffusion and dissocia
tion mechanisms is performed. It is ascertained that free hydrogen atoms di
ffusion in the sample and 'defect-hydrogen' dissociation spoil passivation.
Analytical dependences obtained make it possible to predict spatial and ti
me defect distribution under hydrogen passivation of silicon depending on e
xperimental conditions, (C) 2001 Published by Elsevier Science B.V.