APPLICATION OF RESONANT X-RAY EMISSIONS FOR MOLECULAR ELECTRONIC STRUCTURE-ANALYSIS OF BORON NITRIDES/

Citation
Y. Muramatsu et al., APPLICATION OF RESONANT X-RAY EMISSIONS FOR MOLECULAR ELECTRONIC STRUCTURE-ANALYSIS OF BORON NITRIDES/, Applied physics A: Materials science & processing, 65(2), 1997, pp. 191-194
Citations number
13
Categorie Soggetti
Physics, Applied
ISSN journal
09478396
Volume
65
Issue
2
Year of publication
1997
Pages
191 - 194
Database
ISI
SICI code
0947-8396(1997)65:2<191:AORXEF>2.0.ZU;2-I
Abstract
We describe the application of resonant X-ray emissions for molecular/ electronic structure analysis of boron nitrides using quasimonochromat ic undulator radiation at the Photon Factory. Prominent resonant X-ray emissions due to B1s-B2p pi-B1s(-1) transitions were observed in w-B N composed of four-fold boron atoms and in h-BN composed of three-fold boron atoms, when the photon energy of the incident undulator beams c oincided with the B1s-B2p pi absorption energy. However, no resonance was observed in c-BN composed of four-fold boron atoms, The resonant X-ray emission reflects the electronic structure of unoccupied molecul ar orbitals which strongly depend on the conformnations of the boron a toms. These findings confirm that resonant X-ray emissions can be usef ul indices for molecular and electronic structure analysis of boron ni trides.