Y. Muramatsu et al., APPLICATION OF RESONANT X-RAY EMISSIONS FOR MOLECULAR ELECTRONIC STRUCTURE-ANALYSIS OF BORON NITRIDES/, Applied physics A: Materials science & processing, 65(2), 1997, pp. 191-194
We describe the application of resonant X-ray emissions for molecular/
electronic structure analysis of boron nitrides using quasimonochromat
ic undulator radiation at the Photon Factory. Prominent resonant X-ray
emissions due to B1s-B2p pi-B1s(-1) transitions were observed in w-B
N composed of four-fold boron atoms and in h-BN composed of three-fold
boron atoms, when the photon energy of the incident undulator beams c
oincided with the B1s-B2p pi absorption energy. However, no resonance
was observed in c-BN composed of four-fold boron atoms, The resonant
X-ray emission reflects the electronic structure of unoccupied molecul
ar orbitals which strongly depend on the conformnations of the boron a
toms. These findings confirm that resonant X-ray emissions can be usef
ul indices for molecular and electronic structure analysis of boron ni
trides.