EFFECTS OF (100)-TEXTURED LANIO3 ELECTRODE ON THE DEPOSITION AND CHARACTERISTICS OF PBTIO3 THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING

Highly (100)-oriented thin films of PbTiO3 were prepared on (100)-text ured LNO/Pt/Ti/SiO2/Si substrates by rf magnetron sputtering at temper atures greater than or equal to 480 degrees C, while randomly oriented PbTiO3 films were obtained on Pt/Ti/SiO2/Si substrates. The textured LNO layer can help to control the orientation of PbTiO3 thin films, an d reduce their surface roughness quite significantly. The dielectric c onstant (ET) Of PbTiO3 films deposited on LNO was lower than that of f ilms on Pt and the dielectric loss (tan delta) increased when a higher deposition temperature or longer time was used. The highly (100)-text ured PbTiO3 films also showed different ferroelectric hysteresis chara cteristics. i.e., a higher coercive field and a Lower remanent polariz ation, from that of randomly oriented films deposited on Pt.