Certain adsorbates, particularly sulfur and iodine, present at submonolayer
coverages catalyze anodic dissolution or oxidation at selected transition
metal surfaces. No change in adsorbate surface coverage or oxidation state
is observed during the dissolution process, indicating that the process is
truly catalyzed by the adsorbed impurity. This allows enhanced dissolution
to take place in environments entirely free of solvated forms of the impuri
ty. In the case of iodine, the mechanism depends in part on the relative st
rength of iodine-metal vs. metal-metal bond strengths, but also depends on
other factors that are as yet poorly understood. In the case of adsorbed su
lfur, the effect is related to the ability of adsorbed sulfur to hinder the
formation of an oxide layer via the complete dissociation of water at the
solid surface. The relevance of these adsorbate-catalyzed processes to inte
rgranular stress corrosion cracking and semiconductor device processing are
discussed. Copyright (C) 2001 John Wiley & Sons, Ltd.