Deuterium depth profiles at CVD diamond surfaces

Citation
A. Bergmaier et al., Deuterium depth profiles at CVD diamond surfaces, SURF SCI, 481(1-3), 2001, pp. L433-L436
Citations number
15
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
SURFACE SCIENCE
ISSN journal
00396028 → ACNP
Volume
481
Issue
1-3
Year of publication
2001
Pages
L433 - L436
Database
ISI
SICI code
0039-6028(20010610)481:1-3<L433:DDPACD>2.0.ZU;2-0
Abstract
Homoepitaxial diamond films grown by chemical vapour deposition (CVD) in a methane deuterium plasma were investigated for their deuterium and hydrogen content using high resolution elastic recoil detection (ERD) with a depth resolution of about 0.5 nm. The as-grown diamond films showed large surface conductivity as it is used for diamond surface channel field effect transi stors. The ERD measurements revealed an amount of (1.7 +/-0.2) x 10(15) at/ cm(2) of deuterium on the (100) diamond surface, which is in agreement with a deuterium terminated (2 x 1) reconstructed (1 0 0) diamond surface. The hydrogen and deuterium bulk concentration is only about 1.0 x 10(19) at/cm( 3), even at a depth of 1.5 nm below the surface. Therefore, it can be concl uded, that the highly conductive p-type layer in as-deposited CVD diamond f ilms is not due to additionally incorporated hydrogen in the subsurface reg ion in contrary to many conduction models. (C) 2001 Elsevier Science B.V. A ll rights reserved.