The paper describes the new pulsed electron beam facilities GESA designed f
or material surface treatment. These facilities ensure the possibility to r
ealize melting depths of materials in the range of 10-100 mum. Parameters o
f the electron beam produced are as follows: electron energy 50-400 keV; be
am current 200-500A, beam cross-section 50-100 cm(2); pulse duration 5-250
mus, maximum power density at the target - 6 MW/cm(2), maximum energy densi
ty 500 J/cm(2). All beam parameters are controlled independently. (C) 2001
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