Pulsed electron beam facility (GESA) for surface treatment of materials

Citation
V. Engelko et al., Pulsed electron beam facility (GESA) for surface treatment of materials, VACUUM, 62(2-3), 2001, pp. 211-216
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
VACUUM
ISSN journal
0042207X → ACNP
Volume
62
Issue
2-3
Year of publication
2001
Pages
211 - 216
Database
ISI
SICI code
0042-207X(20010615)62:2-3<211:PEBF(F>2.0.ZU;2-K
Abstract
The paper describes the new pulsed electron beam facilities GESA designed f or material surface treatment. These facilities ensure the possibility to r ealize melting depths of materials in the range of 10-100 mum. Parameters o f the electron beam produced are as follows: electron energy 50-400 keV; be am current 200-500A, beam cross-section 50-100 cm(2); pulse duration 5-250 mus, maximum power density at the target - 6 MW/cm(2), maximum energy densi ty 500 J/cm(2). All beam parameters are controlled independently. (C) 2001 Elsevier Science Ltd. All rights reserved.