Thioether derivatives with 1-4 thioether moieties were used as inks in micr
ocontact printing on gold for the reproduction of patterns as they combine
good monolayer quality with synthetic versatility, and high molecular weigh
ts. Self-assembled monolayers (SAMs) on gold of compounds 1 and 2 had a qua
lity comparable to SAMs of decanethiol, both regarding monolayer order and
etch resistance. Etch resistances of SAMs of 3 and 4 were lower. Resulting
structures after etching of patterned SAMs using 1, 2, and 3 were of good q
uality for patterns with feature sizes on the same stamp ranging from 1-200
mum. Patterns of 4 were not reproduced. Overall, compounds 1 and 2 are goo
d candidates for low-diffusion inks.