Microcontact printing with heavyweight inks

Citation
M. Liebau et al., Microcontact printing with heavyweight inks, ADV FUNCT M, 11(2), 2001, pp. 147-150
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
ADVANCED FUNCTIONAL MATERIALS
ISSN journal
1616301X → ACNP
Volume
11
Issue
2
Year of publication
2001
Pages
147 - 150
Database
ISI
SICI code
1616-301X(200104)11:2<147:MPWHI>2.0.ZU;2-3
Abstract
Thioether derivatives with 1-4 thioether moieties were used as inks in micr ocontact printing on gold for the reproduction of patterns as they combine good monolayer quality with synthetic versatility, and high molecular weigh ts. Self-assembled monolayers (SAMs) on gold of compounds 1 and 2 had a qua lity comparable to SAMs of decanethiol, both regarding monolayer order and etch resistance. Etch resistances of SAMs of 3 and 4 were lower. Resulting structures after etching of patterned SAMs using 1, 2, and 3 were of good q uality for patterns with feature sizes on the same stamp ranging from 1-200 mum. Patterns of 4 were not reproduced. Overall, compounds 1 and 2 are goo d candidates for low-diffusion inks.