Fabrication and optical studies of AlGaN/GaN quantum-well waveguides

Citation
Tn. Oder et al., Fabrication and optical studies of AlGaN/GaN quantum-well waveguides, APPL PHYS L, 79(1), 2001, pp. 12-14
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
79
Issue
1
Year of publication
2001
Pages
12 - 14
Database
ISI
SICI code
0003-6951(20010702)79:1<12:FAOSOA>2.0.ZU;2-D
Abstract
We report the successful fabrication and optical study of submicron wavegui de structures based on AlGaN/GaN multiple-quantum wells (MQWs). The MQW str uctures were grown by metalorganic chemical vapor deposition on sapphire su bstrates and the waveguides were fabricated by electron-beam lithography an d inductively coupled plasma dry etching. The waveguides were patterned wit h a fixed width of 0.5 mum but with orientations varying from -30 degrees t o 60 degrees relative to the a axis of GaN. Optical emission from these str uctures was studied by photoluminescence spectroscopy. The peak position an d linewidth of the emission peak were found to vary systematically with the orientations of the waveguides and followed the sixfold symmetry of a wurt zite structure. This is most likely related to the anisotropy of the excito n/carrier diffusion coefficient along the different crystal orientations in the quasione-dimensional case. The implication from the results is that in proper designs of photonic and electronic devices where submicron structur es are fabricated in III nitrides one must consider the orientations of the structures. (C) 2001 American Institute of Physics.