Development of quantum well infrared photodetectors at the Center for Quantum Devices

Citation
M. Razeghi et al., Development of quantum well infrared photodetectors at the Center for Quantum Devices, INFR PHYS T, 42(3-5), 2001, pp. 135-148
Citations number
43
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
INFRARED PHYSICS & TECHNOLOGY
ISSN journal
13504495 → ACNP
Volume
42
Issue
3-5
Year of publication
2001
Pages
135 - 148
Database
ISI
SICI code
1350-4495(200106/10)42:3-5<135:DOQWIP>2.0.ZU;2-T
Abstract
Results of detector characterization are presented for quantum well infrare d photodetectors (QWIPs) fabricated from a variety of III-V material system s lattice-matched to GaAs or InP substrate, p-Type GaAs/GaInP QWIPs show ba ckground limited performance up to temperatures of 120 K, while p-type GaIn AsP/GaInAsP QWIPs exhibit broadband response from lambda = 2.5-10 mum. n-Ty pe GaAs/GaInP QWIPs are sensitive deep into the VLWIR with very low dark cu rrent. Extremely large responsivities of 33.2 AW(-1) were obtained from n-t ype GaInAs/InP QWIPs operating at lambda = 9 mum. Devices made from n-type AlGaInAs/InP and GaInAs/AlInAs have also been realized that extend the wave length range of sensitivity from 3 mum out to 20 mum while remaining lattic e-matched to InP. Lattice-matched multispectral detectors are demonstrated for sensitivity at both 4 and 8.5 mum Localized epitaxy of GaInAs/InP super lattice structures lattice-matched to InP was performed on Si substrate for the purpose of monolithic integration of III-V QWIPs with Si-based read-ou t integrated circuitry. (C) 2001 Elsevier Science B.V. All rights reserved.