Spectroscopic ellipsometry and Raman study of fluorinated nanocrystalline carbon thin films

Citation
H. Lee et al., Spectroscopic ellipsometry and Raman study of fluorinated nanocrystalline carbon thin films, J APPL PHYS, 90(2), 2001, pp. 813-818
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
2
Year of publication
2001
Pages
813 - 818
Database
ISI
SICI code
0021-8979(20010715)90:2<813:SEARSO>2.0.ZU;2-L
Abstract
Using spectroscopic ellipsometry and Raman spectroscopy, we measured the ps eudodielectric function and the phonon frequencies of fluorinated nanocryst alline carbon (nc-C:F) thin films grown on silicon substrate at varying gro wth temperature and gas flux ratio of CH4 and CF4. Utilizing the Tauc-Loren tzian formula, we performed multilayer analysis to estimate the dielectric function of the fluorinated nanocrystalline carbon thin films. We also adop ted Gaussian-like density-of-states model proposed by Demichelis [Phys. Rev . B 45, 14364 (1992)] and estimated the amplitude A, the transition energy E-pi, and the broadening sigma (pi) of pi --> pi* transitions. Based on thi s model, we explained the change of the optical gap and the refractive inde x in terms of the change of the amplitude A rather than the shift of transi tion energy E-pi of pi --> pi* transitions. Raman and ellipsometric study s uggested that the average size of nanocrystallites in the fluorinated carbo n thin films was smaller than that of amorphous hydrogenated carbon films s tudied by Hong [Thin Solid Films 352, 41 (1999)]. (C) 2001 American Institu te of Physics.