Determination of the pyroelectric coefficient in strained InGaAs/GaAs quantum wells grown on (111)B GaAs substrates

Citation
S. Cho et al., Determination of the pyroelectric coefficient in strained InGaAs/GaAs quantum wells grown on (111)B GaAs substrates, J APPL PHYS, 90(2), 2001, pp. 915-917
Citations number
16
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
90
Issue
2
Year of publication
2001
Pages
915 - 917
Database
ISI
SICI code
0021-8979(20010715)90:2<915:DOTPCI>2.0.ZU;2-O
Abstract
We report an experimental determination of the pyroelectric coefficient for strained InGaAs layers in a pseudomorphic piezoelectric In0.17Ga0.83As/GaA s multiquantum well in a p-i-n diode configuration which was grown on a (11 1)B GaAs substrate by molecular-beam epitaxy. By analyzing the Franz-Keldys h oscillations in the photoreflectance spectra over the temperature range 1 1-300 K, we obtained the temperature dependence of the piezoelectric field, from which the temperature variation of the piezoelectric constant e(14) w as deduced. A linear dependence of e(14) with temperature was observed. The refore, the strain-induced component of the pyroelectric coefficient of (9. 3 +/-0.3)x10(-7) C/m(2) K was determined for this material system. (C) 2001 American Institute of Physics.