Oxygen-related deep level defects in solid-source MBE grown GaInP

Citation
N. Xiang et al., Oxygen-related deep level defects in solid-source MBE grown GaInP, J CRYST GR, 227, 2001, pp. 244-248
Citations number
19
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
227
Year of publication
2001
Pages
244 - 248
Database
ISI
SICI code
0022-0248(200107)227:<244:ODLDIS>2.0.ZU;2-V
Abstract
We report the first observation of oxygen-related deep level defects in sol id-source MBE-grown GaInP. Si-doped GaInP samples were studied by deep leve l transient spectroscopy (DLTS), secondary-ion mass spectrometry (SIMS), ca pacitance-voltage (C-V) profiles, and photoluminescence (PL). Different amo unts of oxygen impurities was introduced into GaInP epilayers by growing wi th different phosphorus cracking temperatures. Four traps vr ere resolved b y DLTS from the GaInP samples. Among them, two traps, with thermal activati on energies of 0.45-0.46 and 0.63 0.82 eV, were found to be oxygen-related. (C) 2001 Elsevier Science B.V. All rights reserved.