Substrate temperature dependence of surface migration of As atoms during molecular beam epitaxy of GaAsP on a (411)A GaAs substrate

Surface migration lengths of As adatoms on (4 1 1)A GaAs surfaces during mo lecular beam epitaxy were determined for the first time from lateral profil es of the arsenic content (x) in the GaAsxP1-x layers grown on GaAs channel ed substrates (CSs) using As-4 and P-2 beams. The x on the (4 1 1)A side-sl ope region near the edge of the (1 0 0) region increased from that on the f lat (4 1 1)A GaAs substrate, indicating that As adatoms flow from the (1 0 0) region to the (4 1 1)A side-slope region. The observed surface migration length of As adatoms was 15 +/-2 mum on the (4 1 1)A GaAs surface at 535 d egreesC. The surface migration length of As adatoms on (4 1 1)A GaAs surfac e slightly increases to 20 +/-2 mum with increase of the substrate temperat ure to 605 degreesC. The substrate temperature (T-s) dependence of surface migration length of As adatoms on the (4 1 1)A GaAs surface is discussed. ( C) 2001 Elsevier Science B.V. All rights reserved.