To study the influence of the growth parameters on structural properties an
d crystal quality epitaxial layers of AlN and AlxGa1-xN (x = 0 1) were grow
n in an RF-plasma enhanced MBE-system on Si-terminated (00.1) SIC, (00.1) s
apphire and (! 1 1) Si substrates by varying substrate temperature, growth
rate and III/V ratio. The alloy composition of the AlxGa1-xN layers was stu
died by RBS-measurements and the results were compared with X-ray diffracti
on and with the optical properties obtained from cathodoluminescence ICL).
The formation of an AlxGa1-xN superstructure is observed with ordered Al an
d Ga distribution. Increasing degree of chemical ordering is observed with
increasing growth temperature. The CL-spectra at 77 It show relatively shar
p near-band-edge transitions for pure AlN and Ga-rich compositions indicati
ng high material quality. The near-band-edge transition follows the composi
tion of the solid solution connected with a broadening of the peaks and evi
dent optical bowing for samples grown at low growth rates (< 0.35 mum/h). A
decrease of the bowing parameter is observed for the entire range of alloy
composition by increasing the growth rate. (C) 2001 Published by Elsevier
Science B.V.