B. Damilano et al., InGaN heterostructures grown by molecular beam epitaxy: from growth mechanism to optical properties, J CRYST GR, 227, 2001, pp. 466-470
GaN and InGaN layers are grown by molecular beam epitaxy using ammonia as n
itrogen precursor. The lattice mismatch between InN and GaN is very large a
nd a Stranski-Krastanov (SK) growth mode transition can occur above a criti
cal In composition. However, changing the growth conditions, namely increas
ing the NH3 flux, allows one to promote the 2D growth. This phenomenon can
be ascribed to a surfactant effect of hydrogen atoms (or NHx radicals) pres
ent at the growth surface. The optical properties of InGaN/GaN quantum dots
, made by SK growth mode, and InGaN/GaN quantum wells are compared. (C) 200
1 Elsevier Science B.V. All rights reserved.