Growth of high quality InGaAsN heterostructures and their laser application

Citation
Ay. Egorov et al., Growth of high quality InGaAsN heterostructures and their laser application, J CRYST GR, 227, 2001, pp. 545-552
Citations number
8
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
227
Year of publication
2001
Pages
545 - 552
Database
ISI
SICI code
0022-0248(200107)227:<545:GOHQIH>2.0.ZU;2-0
Abstract
Focus of this work is the optimization of growth to achieve high quality la ser material for emission at 1.3 mum and beyond. GaAs/CaAsN/InCaAsN heteros tructures were grown by solid source molecular beam epitaxy. To achieve opt imum crystal quality of InGaAsN heterostructures, growth was followed by a high temperature treatment at about 700 degreesC, The high optical quality of our annealed material is attested by large exciton recombination lifetim es (more than 2 ns). Consequently, a decrease of single quantum well transp arency current density down to 100 A/cm(2) is found and SWQ lasers with thr eshold current densities as low as 350A/cm(2) have been made. This represen ts clearly the lowest laser thresholds reported so far for emission around 1.3 mum from the InGaAsN material system. (C) 2001 Published by Elsevier Sc ience B.V.