Hp. Xin et al., Gas-source MBE growth of Ga(In)NP/GaP structures and their applications for red light-emitting diodes, J CRYST GR, 227, 2001, pp. 558-561
We have studied the effects of N incorporation in Ga(In)P and explored thei
r applications for light-emitting diodes (LEDs). The GaInNP epilayers were
grown on (1 0 0) GaP substrates by gas-source MBE using an RF nitrogen radi
cal beam source. Red LEDs based on GaN0.011 P-0.989/GaP double-heterostruct
ure grown on (1 0 0) Gap substrates were successfully fabricated. Compared
to conventional AlGaInP LEDs, this LED eliminates etching of the GaAs subst
rate and wafer-bonding of a transparent GaP substrate. Partially relaxed Ga
N0.011P0.989 active layers, however, degraded the emission efficiency. Inco
rporation of In in GaN0.015P0.985 alloy to lattice-match to GaP not only ma
intains the direct band gap. but also improves the sample structural qualit
y and increases the integrated PL intensity by 40%, compared to GaN0.015P0.
985. (C) 2001 Elsevier Science B.V. All rights reserved.