Gas-source MBE growth of Ga(In)NP/GaP structures and their applications for red light-emitting diodes

Citation
Hp. Xin et al., Gas-source MBE growth of Ga(In)NP/GaP structures and their applications for red light-emitting diodes, J CRYST GR, 227, 2001, pp. 558-561
Citations number
13
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
227
Year of publication
2001
Pages
558 - 561
Database
ISI
SICI code
0022-0248(200107)227:<558:GMGOGS>2.0.ZU;2-D
Abstract
We have studied the effects of N incorporation in Ga(In)P and explored thei r applications for light-emitting diodes (LEDs). The GaInNP epilayers were grown on (1 0 0) GaP substrates by gas-source MBE using an RF nitrogen radi cal beam source. Red LEDs based on GaN0.011 P-0.989/GaP double-heterostruct ure grown on (1 0 0) Gap substrates were successfully fabricated. Compared to conventional AlGaInP LEDs, this LED eliminates etching of the GaAs subst rate and wafer-bonding of a transparent GaP substrate. Partially relaxed Ga N0.011P0.989 active layers, however, degraded the emission efficiency. Inco rporation of In in GaN0.015P0.985 alloy to lattice-match to GaP not only ma intains the direct band gap. but also improves the sample structural qualit y and increases the integrated PL intensity by 40%, compared to GaN0.015P0. 985. (C) 2001 Elsevier Science B.V. All rights reserved.