Molecular beam epitaxial growth of Zn1-xMgxS alloy thin films on GaP (1 0 0
) substrates is reported. In situ reflection high energy electron diffracti
on (RHEED) studies show that the alloys can be grown with stable zinc-blend
e structure up to x around 30%. For x > 30% a phase transition will occur a
t a critical thickness which is sensitively dependent on the composition x.
Several Schottky barrier photodetectors using Zn1-xMgxS layer, with thickn
ess less than the critical thickness, as active layer were Fabricated. High
ultra-violet responsivity and excellent visible rejection are achieved. Th
e response curve of the Zn0.43Mg0.57S device offers a long wavelength cut-o
ff at 295 nm and closely matches the erythemal action spectrum that describ
es human skill sensitivity to UV radiation. (C) 2001 Elsevier Science B.V.
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