A. Abdellaoui et al., STRUCTURE AND OPTICAL-PROPERTIES OF BORON-NITRIDE THIN-FILMS PREPAREDBY PECVD, Materials science & engineering. B, Solid-state materials for advanced technology, 47(3), 1997, pp. 257-262
Boron nitride (BN) thin films were deposited from borane dimethylamine
and nitrogen using a plasma enhanced CVD technique at low temperature
. The deposited films were characterized by X-ray diffraction, XPS spe
ctroscopy, infrared absorption spectroscopy, and scanning electron mic
roscopy. All the films crystallized in the hexagonal form of BN, and c
onsisted of microcrystals with about 50 nm grain size. Optical reflect
ance and transmittance measurements of the films were recorded in the
wavelength range 220-2500 nm. The optical constants, refractive index
n and extinction coefficient k, of the films were calculated from thes
e experimental data, by a numerical method based on the use of Fresnel
's formalism via an iterative process. An optical gap E-g of about 3.6
eV has been deduced. (C) 1997 Elsevier Science S.A.