In this paper we demonstrate the use of control charts based on orthogonal
contrasts for a semiconductor manufacturing process. The statistical perfor
mance of individuals control charts based on these contrasts and their expo
nentially weighted moving average counterparts is compared to that of the t
raditional approach. Contrast-based charts have superior detection capabili
ties than the traditional approach when targeted at specific process distur
bances. Copyright (C) 2001 John Wiley & Sons, Ltd.