FLOW CHARACTERISTICS OF A VERTICAL SPINNING DISK, LOW-PRESSURE VAPOR-DEPOSITION APPARATUS

The flow characteristics of a new vertical spinning disk, low-pressure vapor deposition apparatus were studied. The nominal boundary-layer t hickness dependence on the reactor pressure, substrate rotation rate, and substrate temperature were examined with the aid of a smoke that w as generated from hydrolyzed TiCl4 vapor, The measured nominal boundar y layer thickness was found to have a strong dependence on the reactor pressure and the substrate rotation rate, whereas the temperature dep endence was not easily resolved by the present method. The experimenta l data and the theoretical prediction were found to agree within the a ccuracy of the measurements.